Plasmon–Phonon Coupling in Large-Area Graphene
Dot and Antidot Arrays Fabricated by Nanosphere Lithography
Xiaolong Zhu
Weihua Wang
Wei Yan
Martin
B. Larsen
Peter Bøggild
Thomas
Garm Pedersen
Sanshui Xiao
Jian Zi
N. Asger Mortensen
10.1021/nl500948p.s001
https://acs.figshare.com/articles/journal_contribution/Plasmon_Phonon_Coupling_in_Large_Area_Graphene_Dot_and_Antidot_Arrays_Fabricated_by_Nanosphere_Lithography/2297383
Nanostructured graphene on SiO<sub>2</sub> substrates paves the
way for enhanced light–matter interactions and explorations
of strong plasmon–phonon hybridization in the mid-infrared
regime. Unprecedented large-area graphene nanodot and antidot optical
arrays are fabricated by nanosphere lithography, with structural control
down to the sub-100 nm regime. The interaction between graphene plasmon
modes and the substrate phonons is experimentally demonstrated, and
structural control is used to map out the hybridization of plasmons
and phonons, showing coupling energies of the order 20 meV. Our findings
are further supported by theoretical calculations and numerical simulations.
2014-05-14 00:00:00
substrate phonons
Nanosphere LithographyNanostructured graphene
order 20 meV
regime
hybridization
graphene plasmon modes
Antidot Arrays Fabricated
nanosphere lithography
interaction
graphene nanodot
SiO 2 substrates