Low-Temperature
Sputtered Nickel Oxide Compact Thin Film as Effective Electron Blocking
Layer for Mesoscopic NiO/CH<sub>3</sub>NH<sub>3</sub>PbI<sub>3</sub> Perovskite Heterojunction Solar Cells
Kuo-Chin Wang
Po-Shen Shen
Ming-Hsien Li
Shi Chen
Ming-Wei Lin
Peter Chen
Tzung-Fang Guo
10.1021/am503610u.s001
https://acs.figshare.com/articles/journal_contribution/Low_Temperature_Sputtered_Nickel_Oxide_Compact_Thin_Film_as_Effective_Electron_Blocking_Layer_for_Mesoscopic_NiO_CH_sub_3_sub_NH_sub_3_sub_PbI_sub_3_sub_Perovskite_Heterojunction_Solar_Cells/2265349
We introduce the use of low temperature
sputtered NiOx thin film, which substitutes the PEDOT–PSS and
solution-processed NiOx as an effective electron blocking layer for
mesoscopic NiO/CH<sub>3</sub>NH<sub>3</sub>PbI<sub>3</sub> perovskite
solar cells. The influences of film thickness and oxygen doping on
the photovoltaic performances are scrutinized. The cell efficiency
has been improved from 9.5 to 10.7% for
devices using NiOx fabricated under pure argon atmosphere. With adequate
doping under 10% oxygen flow ratio, we achieved power conversion efficiency
of 11.6%. The procedure is large area scalable and has the advantage
for cost-effective perovskite-based photovoltaics.
2014-08-13 00:00:00
power conversion efficiency
oxygen doping
area scalable
NiO
argon atmosphere
photovoltaic performances
cell efficiency
PEDOT
Effective Electron Blocking Layer
film thickness
NiOx