Low-Temperature Sputtered Nickel Oxide Compact Thin Film as Effective Electron Blocking Layer for Mesoscopic NiO/CH<sub>3</sub>NH<sub>3</sub>PbI<sub>3</sub> Perovskite Heterojunction Solar Cells Kuo-Chin Wang Po-Shen Shen Ming-Hsien Li Shi Chen Ming-Wei Lin Peter Chen Tzung-Fang Guo 10.1021/am503610u.s001 https://acs.figshare.com/articles/journal_contribution/Low_Temperature_Sputtered_Nickel_Oxide_Compact_Thin_Film_as_Effective_Electron_Blocking_Layer_for_Mesoscopic_NiO_CH_sub_3_sub_NH_sub_3_sub_PbI_sub_3_sub_Perovskite_Heterojunction_Solar_Cells/2265349 We introduce the use of low temperature sputtered NiOx thin film, which substitutes the PEDOT–PSS and solution-processed NiOx as an effective electron blocking layer for mesoscopic NiO/CH<sub>3</sub>NH<sub>3</sub>PbI<sub>3</sub> perovskite solar cells. The influences of film thickness and oxygen doping on the photovoltaic performances are scrutinized. The cell efficiency has been improved from 9.5 to 10.7% for devices using NiOx fabricated under pure argon atmosphere. With adequate doping under 10% oxygen flow ratio, we achieved power conversion efficiency of 11.6%. The procedure is large area scalable and has the advantage for cost-effective perovskite-based photovoltaics. 2014-08-13 00:00:00 power conversion efficiency oxygen doping area scalable NiO argon atmosphere photovoltaic performances cell efficiency PEDOT Effective Electron Blocking Layer film thickness NiOx